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| 【有獎交流】積極回復本帖子，參與交流，就有機會分得作者 nick225 的 30 個金幣 | |||
nick225新蟲 (初入文壇)
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[交流]
現(xiàn)在想利用電沉積的方法生長銅枝晶，請大神們看看如何設置工作站，謝謝！
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我找了一個參考文獻，但是不太會設置電化學工作站，請大神幫我看看吧！感激不盡！ [In a typical fabrication procedure, a two-electrode configuration of the electrochemical system was used. A copper gauze 140 mesh woven, wire diameter ≈ 50 μm) substrate was used as a working electrode and a copper plate was used as a counter electrode. Here, the copper plate (counter electrode) was polished using a sandpaper to remove surface contaminants before the electrodeposition process. The Cu NPF was then grown by electrodeposition in an aqueous electrolyte containing 0.05 m CuSO4, 0.1 m NaBr (or NaCl), and 0.1 m H2SO4 at a deposition voltage of −0.2 V for 20 s, and subsequently in the voltage range of −0.9 to −1.8 V for 200–300 s. After electrodeposition of the Cu NPF, the sample was rinsed in a deionized (DI) water bath for 10 min to remove the remaining reactant ions (e.g., Cu2+, Br–, and H2SO4) on its surface.] -----10.1002/aenm.201803764 這里的沉積過程在電化學工作站上應該選擇什么模式呢？  |
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